X-ray Fluorescence Spectroscopy – Energy Dispersive X-ray Spectrometry, XRF-EDX

Principle

By applying X-rays that generated by an X-ray tube, the energy specific to the elements contained in the sample is generated. These X-rays are detected by a Si-semiconductor detector. It examines the type of constituent elements of the sample and the composition of elements roughly. This is a non-destructive analysis method and it enables rapid elemental analysis of solids and powders.

Fig.1  Principle of XRF-EDX

When an atom is irradiated with X-rays, the electrons are ejected from the inner orbit. Outer  shell electrons fall into the orbit of the inner shell. At that time, X-rays (characteristic X-rays) corresponding to the energy difference between the two orbits are emitted. This characteristic X-ray is unique to each element, so that you can know the type of element.

Fig.2  left: Sample installation, Right: Sketch of sample installation 

The sample is placed in the sample chamber of 460 (W) mm × 360 (D) mm × 150 (H) mm and X-ray is irradiated from the bottom.

Fig.3  XGT-1000WR (HORIBA)

Application (e.g.)

• RoHS rough quantitative analysis (Cd, Pb, Cr, Hg, Br)
• Analysis of main element of materials
• Analysis of foreign materials with a size of several mm
• Elemental analysis of ₁₄Si ~ ₉₂U with a detection limit of 0.1 % – 1 %

Acceptance conditions

Table 1　 Acceptance conditions for XRF-EDX analysis